DB53/T 421-2012
Determination of boron in industrial silicon by inductively coupled plasma atomic emission spectrometry (English Version)

Standard No.

DB53/T 421-2012

Language

Chinese, Available in English version

Release Date

2012

Published By

Yunnan Provincial Standard of the People's Republic of China

Latest

DB53/T 421-2012

Scope

This standard specifies the method for the determination of boron in industrial silicon by inductively coupled plasma optical emission spectrometry. This standard is applicable to the determination of boron in industrial silicon, with a detection range of 0.000 4% to 0.017%.

DB53/T 421-2012 history

• 2012 DB53/T 421-2012 Determination of boron in industrial silicon by inductively coupled plasma atomic emission spectrometry