JEDEC JESD92-2003
Procedure for Characterizing Time- Dependent Dielectric Breakdown of Ultra-Thin Gate Dielectrics

Standard No.
JEDEC JESD92-2003
Release Date
2003
Published By
(U.S.) Joint Electron Device Engineering Council Soild State Technology Association
Scope
This document defines a constant voltage stress test procedure for characterizing time-dependent dielectric breakdown or “wear-out” of thin gate dielectrics. The test is designed to obtain voltage and temperature acceleration parameters required to estimate oxide life at use conditions. Unlike highly accelerated ramp tests that are designed to be extremely fast and performed at the waferlevel, the constant voltage test procedure may be conducted over long periods of time. It may be applied at the wafer-level or with packaged devices.



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